Vistec Electron Beam

As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography. Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications as silicon and compound semiconductor direct write and mask writing as well as integrated optics, silicon photonics and several new emerging markets and advanced research. The company is located in Jena, Germany and maintains in addition to its production facility in Germany service and support centers in Western Europe, Asia and in the US.